NanoESCA for Momentum Microscopy and XPS System

CEA Saclay, Paris

PES ARPES XPS UPS PEEM Momentum Microscopy μARPES

Reference Number: 115201

Investigation of :

  • Ferroelectrica, (BaTiO3, BiFeO3)  
  • Resistive oxide memories (post – CMOS technology)
  • Graphene on SiC
  • HIS 14 VUV source for momentum microscopy
  • Extended prep-chamber with XPS capability

Integrated Instruments